driving next-generation wet-chemical processing
highlights
- The DEU provides exact rotary and vertical movement for single-wafer wet cleaning machines
- designed to handle aggressive chemicals while maintaining µm-level positioning and minimal particle generation
- ensuring smooth, stable motion with long service life for next-generation semiconductor production
In semiconductor manufacturing, every micron counts. Machines operate in tight spaces, chemicals are aggressive, and wafers must be handled with absolute precision. At the heart of this challenge lies the Drive and Elevating Unit (DEU) from KML—a precision electromechanical subsystem designed to deliver smooth, controlled motion and pinpoint vertical positioning for single-wafer wet cleaning equipment.
The journey to the DEU began with a simple question: how can we combine rotary and linear motion in a compact space without compromising reliability or performance? Engineers at KML approached this challenge by integrating torque and linear motor technologies into a single, cohesive motion solution. But the demands went far beyond mere movement. The system had to endure chemically aggressive environments, maintain µm-level concentricity, minimize particle generation, and perform consistently in the cleanest of cleanrooms.
Every component was carefully considered. The cast base body provides a rigid foundation, while a rotary axis with a ball screw ensures precise vertical motion. Hybrid high-precision bearings and hollow-shaft direct drives deliver flawless rotation, and pre-stressed roller guides with special lubricants keep motion smooth under highly dynamic loads. Even the surfaces themselves are specially coated, and vacuum chambers suppress particle contamination.
What emerged was more than a collection of parts—it was an integral, compact system with exceptional rigidity, near-perfect reliability, and almost 100% machine availability. Every DEU undergoes rigorous functional testing to guarantee the stability and repeatability required for next-generation semiconductor production.
Over the years, the DEU has evolved with the industry. It continues to support high-volume production while meeting the increasingly stringent demands of wet-chemical processes. For KML, the DEU is a perfect example of how precision engineering, careful material selection, and innovative motion technology come together to create a system that performs flawlessly under the harshest conditions.